电子工业用混合气体

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AsH3 Ar 5ppm-5% H2 5ppm-5%
He 5ppm-5% N2 5ppm-5%
B2H6 Ar 5ppm-5% H2 5ppm-5%
He 5ppm-5% N2 5ppm-5%
(CH3)2Zn Ar 25ppm-2000ppm H2 25ppm-2000ppm
He 25ppm-2000ppm N2 25ppm-2000ppm
Kr/F2 Ne F2:0.1-1%; Kr:1.3-3.36%;
Ne Kr:1.3%
He F2:0.2%; Kr:2.,5%
PH3 Ar 5ppm-15% N2 5ppm-15%
He 5ppm-15% Silane 5%-30%
H2 5ppm-15%
PlasmaEtching混合气 CF4 O2:4%; 8%; 10%
He O2:1.76%; CF4:18.94%
O2 CF4:8%
SiH4 Ar 5ppm-15% H2 5ppm-15%
He 5ppm-15% N2 5ppm-15%