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- 产品名称：VTC-600-3HD Combinatorial Plasma Sputtering Coater with Three 2'' magnetron
- 产品型号：VTC-600-3HD
- 产品展商：Shenyang Kejing Auto-Instrument Co., LTD
- 产品文档：无相关文档
- 发布时间：2017-09-18
- 在线询价
简单介绍
VTC-600-3HD Combinatorial Plasma Sputtering Coater with Three 2'' magnetron is newly developed coating equipment for single layer or multilayer ferroelectric thin film, preparation of conductive film, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard and Teflon film.
VTC-600-3HD Combinatorial Plasma Sputtering Coater with Three 2'' magnetron is fit for OLED and solid electrolytes.
产品描述
Product introduction:VTC-600-3HD is a high vacuum coating equipment which is newly developed by our company. It is a combinatorial plasma sputtering system with three 2“ magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and create various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery). This system is also suitable for sequential coating of multiple layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE, etc.Compared with similar equipment, it has the advantages of small size and easy operation, and can be used at a wide range of materials. It is an ideal equipment for preparing various types of material films in the laboratory ,especially for the reseach of solid electrolytes and OLEDs, etc.
SPECIFICATIONS
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Product Name
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Combinatorial Plasma Sputtering Coater with Three 2'' magnetron Sputtering Sources and RF/DC Power Supplies VTC-600-3HD
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Compact Structure
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Input/Output Voltage and Power
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1. Input voltage:AC220V，50Hz/60Hz
2. Total Power:<2.5Kw
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Source Power
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Three sputtering power sources are integrated into one control box
DC source: 500 W power for coating metallic materials
RF source: 300 W power, for coating non-conductive materials
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Magnetron Sputtering Head
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1. Three 2" Magnetron Sputtering Heads with water cooling jackets and shutters are included
2. One Sputting Head Model also available.
3. Target size requirement: 2" diameter
4. Target cooling mode: water cooling
5. Thickness range: 0.1 - 5 mm for both metallic and non-conductive targets (including backing plate)
6. Customized coater: Two DC - One RF; Two RF - One DC; Three DC; Three RF (Please select from Product Options)
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Sample Stage
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1. Sample holder is a rotatable and heatable stage
2. Sample holder size: 140 mm Dia. for. 4" wafer max
3. Rotation speed: 1 - 20 rpm adjustable for uniform coating
4. The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy ± 1.0 °C via a digital temperature controller
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Gas Flow Control
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1. Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gasses .
2. Flow rate:One flow rate is 100SCCM,the other flow rate is 200SCCM
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Vacuum Pump Station
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Power of theVacuum Pump :300W
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Water Chiller
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Power of the Water Chiller:350W
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Optional
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1. Precise quartz Film Thickness Monitor is optional, which can be into the chamber to monitor coating thickness with an accuracy of 0.10 Å
2. Precision Thin Film & Coating Analysis Systems is available at extra cost
3. Various 2” oxide and metallic targets are available upon request at extra cost. Silver epoxy and copper backing plates can be ordered at MTI
 
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Overall Dimensions
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Host Dimension:500mm×560mm×660mm（20" × 22" × 26"）
Total Dimension:1300mm×660mm×1200mm（52" × 26" × 48"）
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Net Weight of Coater
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160 kg
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Compliance
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CE approval
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Warranty
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One year limited warranty with lifetime support
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