洁净干燥箱CLH系列 CLH-21CD(Ⅲ)

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产品名称：洁净干燥箱CLH系列
产品型号：CLH-21CD(Ⅲ)，CLH-21CDH(Ⅲ)，CLH-21CD(Ⅴ)，CLH-35CD(Ⅲ)，C
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简单介绍

洁净干燥箱CLH系列 Excellent heat efficiency and temperature uniformity The best for semiconductor wafers and glass substrate Inert gas introduction available

产品描述

洁净干燥箱CLH系列:

By the combination of the heat-resistant filter and cooling system, clean process in high temperature and operation temperature 450 deg-C is available. The best for wafer process, optical memory disc and liquid crystal.

High Temperature Clean Room Oven CLH Series

Excellent heat efficiency and temperature uniformity
The best for semiconductor wafers and glass substrate
Inert gas introduction available

Baking and curing for semiconductor wafers and glass substrate
Oxygen concentration meter, signal tower, cold trap, emergency stop, water leaking
detector

CLH series specifications
Cleaness	CLASS100(temperature stable time) / CLASS500(up and down temperature time)
Oxygen concentration	Less than 20 ppm
System control	Programmed controller
Accuracy	±0.1%FS±1digit
Recipes	19 (30segment/recipe)
Temperature control	Auto tuning PID control
Shelf plate withstand load	15kg/shelf
Chamber pressure meter	0~2kPa
Filter pressure meter	0~1kPa
Thermocouple	Type-K
Exhaust port	1B/ball value
Safety feature	Electric leak breaker, heat protection, motor over-load protection, control circuit breaker, cooling water flow meter
Accessories	2 shelves (with shelf plates)

	CLH-21CD(Ⅲ)	CLH-21CDH(Ⅲ)	CLH-21CD(Ⅴ)
Method	Convection (side-flow)		Convection rear to front
Maximum temperature(*1)	450 deg-C	530 deg-C	500 deg-C
Operation temperature(*1)	RT+70~450 deg-C	RT+70~530 deg-C	RT+70~500 deg-C
Temperature distribution(*2)	±5(at 450)deg-C	±8(at 530)deg-C	±5(at 500)deg-C
Heat up time(*1)	Within 80 minutes (RT+70~450 deg-C)	Within 90 minutes (RT+70~530 deg-C)	Within 80 minutes (RT+70~500 deg-C)
Cool down time (Reference)	Within 90 minutes (450~100 deg-C)	Within 100 minutes (530~100 deg-C)	Within 90 minutes (500~100 deg-C)
Filter	Heat-resistant HEPA filter
O₂ concentration	20ppm within 45 minutes (N₂⋅150L/min introduce)
Heater power	33.6kW(at 200V)		21kW(at 200V)
Temperature recorder	1 pen temperature recorder (control point)
Outside dimension(mm)	1285(W)×2020(H)×1605(D)		1180(W)×2110(H)×1670(D)
Inside dimension(mm)	670(W)×700(H)×500(D)		700(W)×700(H)×500(D)(*3)
Equipment weight	About 1050kg		About 1100kg
Breaker capacity	AC 200V 150A 3 phases 50/60 Hz		AC 200V 75A 3 phases 50/60 Hz

	CLH-35CD(Ⅲ)	CLH-35CDH(Ⅲ)
Method	Convection (Side-flow)
Maximum temperature(*1)	450 deg-C	530 deg-C
Operation temperature(*1)	RT+70~450 deg-C	RT+70~530 deg-C
Temperature distribution(*2)	±5 (at 450 ) deg-C	±8 (at 530 ) deg-C
Heat up time (*1)	Within 70 minutes (RT+70~450 deg-C)	Within 120 minutes (RT+70~530 deg-C)
Cool down time (Reference)	Within 100 minutes (450~100 deg-C)	Within 120 minutes (530~100 deg-C)
Filter	Heat-resistant HEPA filter
O₂ concentration	Within 50 minutes (N₂⋅250L/min introduce)
Heater power	48.3kW(at 200V)
Temperature recorder	1 pen temperature recorder (control point)
Outside dimension(mm)	1285(W)×2080(H)×1775(D)
Inside dimension(mm)	670(W)×790(H)×670(D)
Equipment weight	1250kg
Breaker capacity	AC 200V 175A 3 phases 50/60 Hz
(1) Heat-up available temperature is figures at control point in a heating chamber. (2) Valid dimension is two-thirds inside dimension. (*3) Inside width is 700 mm, opening width is 630 mm.

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洁净干燥箱CLH系列

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