日本YAMATO低温等离子灰化机 PR300/301
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Model
300
301
Method
Barrel type of DP DP : direct plasma
High-frequency Output
Max.300W
Oscillating Frequency
13.56MHz
Reaction Chamber
ø64×160mm 3 chambers
ø118×160mm 1 chamber
The PR 300 is a gas plasma device that is used widely for such applications as production of semiconductors and analysis work.(PR300型等离子灰化机是一种广泛应用于半导体分析工作上的气体等离子装置。) It boasts outstanding operability and safety,(有着十分突出的可操作性和**性) with an automatic tuning system as a standard component and other features. It has a compact design(小型化设计), with a small-size HF generator and an oscillation section integrated with a portion of the chamber,(配有小型高频发生器和振荡部件的综合性工作室) allowing it to be installed into a 19-inch rack.(允许放置19英寸支架)
The gas plasma equipment has a wide range of applications from ashing, etching, dry cleaning, etc.
Specifications
PR300
PR301
Barrel type of direct plasma
Control part
High frequency output
300W variable (100W×3 chambers)
Oscillating frequency
13.56 MHz
Output impedance
50Ω
Tuning method
Manual biaxial tuning method
Instrument
Output watt meter (0 to 300W) Reflected wave watt meter (0 to 100W) Vacuum gauge, bourdon's tube type Flow meter, needle valve integrated type, 1 set
Timer
0.1sec. to 999h
Gas inlet
1/4" stainless steel
Power source (50/60Hz)
AC 100/220V, single phase, 1 kVA
Reaction part
Reaction chamber
Made of super hard glass, ø64×160mm×3 chanbers
Made of pyrex glass, ø118×160mm
Electrode structure
Condenser type, 2-way split
Control system
Auto pressure reduction, auto leak valve
Piping material
Stailess steel, Teflon, Copper and Brass
Stainless steel, Teflon
External dimensions(W×D×Hmm)
438×520×556
438×520×656
Weight
Approx. 38kg
Approx. kg
Standard Accessories
Optional Accessories
Sample dish (large) Sample dish (small) Sample shelf Stand
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